Silicon Processing for the VLSI Era:
Volume 3 - The Submicron MOSFET
by Stanley Wolf ©1995 726 pp ISBN: 0-9616721-5-3
Looking for More Depth on MOSFET Device-Physics
Than You Can Find in Other Books? Then, Consider Our
SILICON PROCESSING FOR THE VLSI ERA - Vol. 3:
 "Industrial-Strength" Reference - Tough, but Good!

The MOSFET is the core electronic-device of the the 21st Century. In fact, more MOSFETs have been built than any other man-made object! But there are few rigorous & up-to-date texts about this ubiquitous device.

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Dr. Wolf realized that a detailed, authoritative book about MOSFET device physics & operation was sorely needed. He wrote Vol. 3 to fill this void. It has gained wide acclaim as a key reference on this topic.
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If you are willing to put in the effort to understand our treatise, you will be rewarded with a deep insight into this critical device. Such knowledge is of inestimable value to device & process engineers.
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CONTENTS: SILICON PROCESSING FOR THE VLSI ERA - Vol. 3

Ch. 1 The Role of Process & Device Models in Microelectronics Technology;
Ch. 2 Numerical Methods for Solving the Partial Differential Equations Which Model the Physics of Submicron Devices & Processes; Ch. 3 MOS Transistor Device Physics: Part 1 - Basic MOS Physics & The MOS Capacitor; Ch. 4 MOS Transistor Device Physics: Part 2 - Long-Channel MOSFETs; Ch. 5 MOS Transistor Device Physics: Part 3 - The Submicron MOSFET; Ch. 6 Isolation Structures in Submicron MOSFETs; Ch. 7 Thin Gate Oxides: Growth & Reliability; Ch. 8 Well Formation in CMOS; Ch. 9 Hot-Carrier-Resistant Processing & Device Structures.
To Download the Complete 16-page Table Contents of Vol. 3 - CLICK HERE
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