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What Others Say About
SILICON PROCESSING FOR THE VLSI ERA – Vol. 2 |
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Review - Published in IEEE Circuits & Devices Mag. January, 1991, p. 53
Written by Prof. Carlton M. Osburn, Dept of EE, NCSU, Raleigh NC "Stanley Wolf has undertaken an extremely formidable task, namely the writing of a text solely devoted to Silicon Process Integration. Several texts, including Vol.-1 of this Series, have been written to explain individual process steps, but these texts have at most one chapter covering device fabrication." "This text, on the other hand, is entirely focused on the collective use of these individual process steps to make state-of-the-art chips. Thus, it fills a much- needed void and is recommended for the library of semiconductor process technologists & designers." "In 9 chapters, Silicon Processing For the VLSI Era - Vol. 2 comprehensively covers the broad range of topics that are central to semiconductor fabrication: isolation, contacts, multilevel metalization, NMOS, CMOS, BiCMOS, bipolar, memories, and process simulation." "Over 1100 additional references (a high proportion of which refer to work in the past couple of years), are cited, and a problem set is included with each chapter to test a student's mastery of the material. This book is certain to achieve widespread use among the process engineeering community." "The comprehensiveness of this text is both its strength and its major weakness. In an attempt to cover a large number of topics, it does not develop any topic very deeply. Typically less than two pages are allocated to each subject, so that the book is more of an encyclopedia for reference than for classroom teaching. Furthermore, by trying to be both current and all-inclusive, the relative importance of different subjects tends to get lost in some instances. The text tends to promulgate the research and development of others without putting an independent perspective on it. Also, because so much of the material comes from other sources, the quality of the graphics is uneven, ranging from clear and concise, to (in a few cases) barely legible." "Despite these limitations, this text represents an important contribution to the field and should be required reading for the beginning engineer. Furthermore, this Reviewer intends to use it substantially as a Supplemental Text to the Graduate Courses on VLSI Technology and Fabrication taught at North Carolina State University."
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Review - ICKnowledge.com Website "This is an Intermediate to Advanced-Level book covering IC Process Integration. That is, it provides the details of how unit-process steps are utilized in sequence to fabricate Integrated Circuits. It is the the only title we are aware of that is exclusively dedicated to this topic. We consider it to be an Essential Reference. Due to the age of the book, topics related to deep-submicron integration are not covered, but this book still provides valuable background information for many basic process integration issues. Specifically, it is still directly relevant for trailing-edge processes. "In any case, we sure hope to see an updated version published someday, as we use this book a lot!" |
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