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SILICON PROCESSING FOR THE VLSI ERA – Vol. 1
MASTER TABLE OF CONTENTS |
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| Return to Main Page of Vol. 1 | Return to the HOME PAGE of LATTICE PRESS |
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PREFACE
Chap. 1 - Silicon: Single-Crystal Growth & Wafer Preparation 1 Chap. 2 - Crystalline Defects & Gettering 35 Chap. 3 - Vacuum Technology for ULSI Applications 70 Chap. 4 - Basics of Thin Films 104 Chap. 5 - Cleaning Technology for ULSI 119 Chap. 6 - Chemical Vapor Deposition of Amorphous & Poly Films 149 Chap. 7 - Silicon Epitaxial Film Growth & Silicon on Insulator 225 Chap. 8 - Thermal Oxidation of Silicon 265 Chap. 9 - Diffusion in Silicon 324 Chap. 10 - Ion Implantation for ULSI 371 Chap. 11 - Aluminum Thin Films & Physical Vapor Deposition 434 Chap. 12 - Lithography I: Optical Photoresists 488 Chap. 13 - Lithography II: Optical Aligners & Photomasks 545 Chap. 14 - Dry Etching for ULSI 655 Chap. 15 - Multilevel Metallization for ULSI 719 Chap. 16 - CMOS Process Integration 807 Chap. 17 - Assembly & Packaging for ULSI 841 INDEX |
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