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HANDBOOK OF SILICON SEMICONDUCTOR TECHNOLOGY
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Editors: W.C. O'Meara, R.B. Herring & L.P. Hunt
© 1990 795 pp. $152.00 |
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CONTENTS
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1. Silicon Precursors (i.e., SiCl4, SiHCl3, SiH2Cl2, SiH4): Their Manufacture & Properties 2. Preparation of Electronic Grade Polysilicon (EGS) 3. Single-Crystal Growth of Silicon 4. Silicon Wafer Preparation 5. Silicon Epitaxy 6. Silicon Material Properties 7. Oxygen, Carbon, & Nitrogen in Silicon 8. Carrier Lifetimes in Silicon 9. Preparation & Properties of Polycrystalline Silicon Films 10. Silicon Phase Diagrams. |
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Dr. Wolf's REVIEW
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| "A comprehensive, big reference book (795 pp) that focuses exclusively on silicon properties and crystal growth, wafering, and polysilicon is handy to have on a semiconductor engineers shelf (or in the company library) from time-to-time. Although this book was published in 1990, is is still the one that best fits the bill. Details are also provided on the manufacture of the silicon halide and silane precursors used in the growth of silicon, and in the deposition processes used to deposit by CVD, thin films of epitaxial silicon, polysilicon, silicon dioxide, and silicon nitride. There also chapters on the various steps of wafering and characterizing silicon wafers, as well as one on the technology of depositing silicon epitaxial films. Finally, as a bonus, there is 90 page chapter on polysilicon thin films by T. Kamins. Although he wrote a book exclusively devoted to polysilicon (~230 pp long), you can get most of the information that you would find in that book in the chapter contained in this book!" | ||
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PRICE: $152.00
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