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MICROLITHOGRAPHY: Science & Technology
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Editors: J.R. Sheats & B.W. Smith
© 1998 780 pp. $175.00 |
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CONTENTS
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1. Exposure Systems 2. System Overview of Optical Steppers & Scanners 3. Optical Lithography Modeling 4. Optical Science for Lithography 5. Krypton Fluoride Excimer Laser for Advnced Microlithography 6. Alignment & Overlay 7. Electron Beam Lithography Systems 8. X-Ray Lithography 9. Chemistry of Photoresists 10. Photoresist Processing 11. Multilayer Resist Technology 12. Dry Etching of Resists 13. Critical Dimension Metrology 14. E-Beam and Proximal Probe Processes for Nanolithography. |
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Dr. Wolf's REVIEW
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| "The successful execution of patterning techniques is so important to ULSI fabrication that the cost of a modern CMOS IC process can be closely estimated simply from the number of masking levels. One title dealing with microlithography for IC fabrication is recommended in Professor's Picks, Microlithography: Science & Technology. It contains invaluable information on modern lithography technology, and emphasizes different aspects of this complex and critical IC manufacturing technology. This text provides a wealth of information for the novice as well as much useful reference material for experienced lthography workers." "The first half of the book begins with what is probably the best description of modern lithography exposure tools in print. That is, there is a wonderful chapter on optical science as applied to lithography, and this is complemented with an excellent description on the technology and operation of optical steppers and scanners. Additional information is then provided in the form of a chapter devoted to KrF Excimer Lasers, another on Algnment & Overlay, and finally one on Optical Lithography Modeling." "The remaining half of the book is split into two parts. The first of these covers Photoresist & Resist Processing, and the second part deals with Metrology for Microlithography. There is a 70 page chapter on the chemistry of photoresists that discusses conventional DNQ-novolac postive resists, chemically-amplified resist systems, resists for ArF (193nm) lithography (only 3 pp of material on this), and new approaches for contrast enhancement during development. Another 50 page chapter describes the various steps involved in resist processing (such as priming, coating, baking, & development). The remaining two chapters on photoresists cover multilayer resist technology and dry-etching of photoresists." "The final portion of the book considers metrology for lithography, and has two chapters. The more interesting one for mainstream lithography workers deals with critical dimension (CD) metrology (70 pages). This chapter begins with background information and definitions on optical metrology techniques, and then discusses the various tools used to measure CDs (optical microscopes - including scanning slit, scanning confocal, and interferometric); scanning electron microscopes (SEMs - 15 pp); scanned probe microscopes (atomic force microscopes - 20 pp); and electrical CD measurements. Finally, a short (3 pp) discussion is given on pattern alignment & placement measurements. The last chapter is for researchers, and deals with metrology for Nanolithography." |
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PRICE: $175.00
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