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HANDBOOK OF
SEMICONDUCTOR WAFER CLEANING TECHNOLOGY |
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Editor: Werner Kern
© 1993 623 pp. $152.00 |
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CONTENTS
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1. Overview and Evolution of Semiconductor Wafer Contamination & Cleaning Technology 2.Trace Chemical Contamination on Silicon Surfaces 3. Aqueous Cleaning Processes 4. Particle Deposition & Adhesion 5. Overview of Dry Wafer Cleaning Processes 6. Ultra-Violet-Ozone Cleaning of Semiconductor Surfaces 7. Vapor Phase Cleaning Technology 8. Remote Plasma Processing for Wafer Cleaning 9. Measurement & Control of Particulate Contaminants 10. Silicon Surface Chemical Composition & Morphology 11. Analysis & Control of Electrically Active Contaminants by Surface Charge Analysis 12. Ultratrace Impurity Analysis of Silicon sufaces by SIMS & TRXF Methods 13. Future Directions. | |
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Dr. Wolf's REVIEW
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| "Wafer cleaning remains a critical IC fabrication step, and the importance of keeping wafer surfaces clean grows with each shrink in feature size. This book, edited by one of the inventors of the "RCA Clean" (Werner Kern, who also contributed its 60 page introductory chapter), remains the best available compendium we know of on wafer cleaning. Though it could use an update (©1993) incorporating the latest improvements in cleaning techniques, no better book on the subject has yet been written since it was published." | ||
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PRICE: $152.00
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